Veeco Instruments Inc
Provides metrology and process equipment systems for industry leaders in the semiconductor, data storage, telecom/wireless and scientific/research markets.
- (516) 677-0200
- (516) 714-1200
- info@veeco.com
- 1 Terminal Drive
Plainview,, NY 11803
United States
Filter Results By:
Applications
-
product
DLC-X Diamond-Like Carbon System
Deposit dense, uniform, and repeatable thin, diamond-like carbon (DLC) films for longer-lasting TFMH slider overcoats and landing pads with Veeco's NEXUS DLC-X System. The Nexus DLC-X features the industry's first production-worthy Pulsed Filtered Cathode Arc Source to enable sub-20A overcoat thickness, and supports improved step coverage for better process yield compared to previous generations.
-
product
Gas and Vapor Delivery Systems
Gas and vapor delivery systems address critical issues facing semiconductor manufacturers and foundries, including material costs, process repeatability and system up-time.
-
product
High Temperature Source
High Temperature Source is available for low-vapor pressure materials at temperatures up to 2000°C.
-
product
MBE Sources
Dopant
For precise control of fluxes for MBE dopant constituents, or for gases that do not require thermal cracking, Veeco's Dopant products are ideal.
-
product
MBE Sources Low Temperature
Achieve accurate and consistent low temperature epitaxial source performance for a variety of applications through Veeco's low temperature epitaxial sources.
-
product
MBE systems
GEN Family
MBE System is the most economical, flexible cluster tool system in a proven platform, allowing for up to three configurable, material-specific growth modules. This enables high system utilization, allowing multiple researchers to use the system at the same time and perform unattended growths and calibrations. This, combined with Veeco components technology, are key factors in why the MBE community is choosing the MBE System, no matter what the application.
-
product
Medium-Temperature MBE Sources
Medium-temperature MBE sources can be used for for virtually any application—from hot-lip SUMO sources to standard filament for thermal effusion.
-
product
Specialty Sources
Veeco offers the most comprehensive selection of MBE sources, including single and dual filament designs.
-
product
Ion Beam Deposition
Create ultra-precise, high-purity, thin film layer devices with maximum uniformity and repeatability with Ion Beam Deposition (IBD) Systems.
-
product
Ion Beam Etch
Nexus IBE Series
Etch precise, complex features for high-yield production of discrete microelectronic devices and components with the NEXUS® Ion Beam Etch (IBE) Systems.
-
product
Ion Beam Sources
Veeco offers the most comprehensive array of ion beam sources for a broad range of applications, including the industry's only Linear gridded sources.
-
product
Physical Vapor Deposition Systems
Physical Vapor Deposition Systems offer maximum flexibility for a wide range of thin film deposition applications with advanced process capabilities, unsurpassed uniformity and multiple deposition modes.
-
product
MOCVD Systems
TurboDisk Family
A rapidly developing technology with multiple proof-of-concept scale installations (1 MW or less), with many more larger-scale projects gaining momentum worldwide within regions with high direct normal irradiance (DNI). As/P MOCVD is proving to be the technology of choice in building the critical compound semiconductor layers for CPV devices. Veeco, supplying best-in-class MOCVD equipment, provides the critical enabling As/P MOCVD technology to reduce the production costs of triple junction solar cells and provides manufacturers with the ability to easily ramp production in a modular system with unmatched reliability and throughput at the lowest cost.
