Rocky Mountain Laboratories, Inc.
Independent ISO certified analytical laboratory specializing in surface chemistry, micro analysis and material characterization.
- (800) 776-5227
(303) 526-9449 - (303) 526-0877
- 602 Park Point Drive,
Suite 101
Golden, CO 80401
United States
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Scanning Electron Microscopy (SEM Analysis)
Rocky Mountain Laboratories, Inc.
Scanning Electron Microscopy (SEM Analysis) can produce images of almost any sample at magnifications of 15-300,000X. The SEM has tremendous depth of field allowing for imaging that cannot be accomplished using optical microscopy. Conductive and nonconductive samples can be imaged. When operated in the backscatter (BSE) detection mode, differences in material composition can be observed. Elemental analysis can be performed on any feature observed with an integrated Energy Dispersive Spectroscopy (EDS) detector.
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Sematech Analysis and SEMI Standards Analysis
Rocky Mountain Laboratories, Inc.
Rocky Mountain Laboratories, Inc. provides SEMI Standards analyses that conform to the following SEMATECH and SEMI Standards for testing of passivated 316L stainless steel components being considered for installation into a high-purity gas distribution system:SEMASPEC #90120401B-STD (SEM Analysis)SEMASPEC #90120402B-STD (EDS Analysis)SEMASPEC #90120403B-STD (XPS Analysis)SEMASPEC #91060573B-STD (Auger (AES) Analysis)SEMI F60-0306 (based on F60-0301) (XPS Analysis)SEMI F72-1102 (Auger (AES) Analysis)
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X-ray Photoelectron Spectroscopy Analysis (XPS Analysis)
Rocky Mountain Laboratories, Inc.
X-ray photoelectron spectroscopy (XPS Analysis) also called Electron Spectroscopy for Chemical Analysis (ESCA) is a chemical surface analysis method. XPS measures the chemical composition of the outermost 100 Å of a sample. Measurements can be made at greater depths by ion sputter etching to remove surface layers.
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Secondary Ion Mass Spectrometry (SIMS Analysis)
Rocky Mountain Laboratories, Inc.
Secondary ion mass spectroscopy is operated either in the dynamic mode (DSIMS) or the static mode (SSIMS). DSIMS is useful for profiling impurity and trace elements through films and interfaces. SSIMS is useful for characterizing polymeric materials and only measures the outermost molecular layer of a specimen.
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Optical Microscopy
Rocky Mountain Laboratories, Inc.
Optical microscopy from 1X to 1000X is achieved with a variety of microscopes. Images can be formed in bright field, dark field, and differential interference contrast (DIC or ‘Nomarski’) modes. Optical microscopy anlaysis is often used before any other techniques to document samples. Color and morphology are important clues in materials identification.
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Auger Electron Spectroscopy (AES)
Rocky Mountain Laboratories, Inc.
Auger Analysis, Auger Electron Spectroscopy (AES or Auger) is a chemical surface analysis method. AES measures the chemical composition of the outermost 100 Å of a sample. Measurements can be made at greater depths by ion sputter etching to remove surface layers.
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Chemical Analysis + Surface Analysis
Rocky Mountain Laboratories, Inc.
An independent surface chemistry and microanalysis laboratory to serve the needs of industrial, academic, and governmental clients. Our objective – to provide real-world solutions for industries with materials and process development needs – is as fundamental to our organization today as when we began. Over the years we have strived to adapt our services to the specific needs of these clients.
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Energy Dispersive X-Ray Spectroscopy (EDS)
Rocky Mountain Laboratories, Inc.
Energy Dispersive Spectroscopy (EDS Analysis) is used in conjunction with the Scanning Electron Microscope (SEM) providing chemical analysis in areas as small as 1 µm in diameter. EDS detects all elements except for H, He, Li, and Be. EDS can be performed exactly on any features or particles seen in the SEM images and can “MAP” elements on a surface. Unknown materials can be identified and quantitative analysis can be performed.
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Cr(VI) ROHS Testing
Rocky Mountain Laboratories, Inc.
Rocky Mountain Laboratories is now offering testing to detect Cr(VI) on the surface of materials. ROHS standards for export of materials to Europe require testing for Cr(VI), and with our XPS instrument, we can provide that testing.
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Scanning Probe Microscopy/Atomic Force Microscopy (SPM/AFM Analysis)
Rocky Mountain Laboratories, Inc.
Scanning probe microscopy (SPM) refers to a family of measurement techniques that utilize a scanning probe. The most common measurement is Atomic Force Microscopy (AFM Analysis), which measures surface topography. Imaged areas can be from the nm scale to as large as 100 µm X 100 µm. Heights and depths of features can be measuredand many surface roughness parameters, e.g Ra, can be calculated. 3-D images can also be produced for dramatic data presentation. Magnetic and electrical response can also be measured with SPM.
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Raman Spectroscopy (Raman)
Rocky Mountain Laboratories, Inc.
Raman is used to analyze organic and inorganic materials. Bulk and small particle materials can be analyzed. Raman microscopy allows for the identification of particle as small as 1 µm.
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Fourier Transform Infrared Spectroscopy (FTIR)
Rocky Mountain Laboratories, Inc.
FTIR Analysis is used to analyze organic materials. Bulk and small particle materials can be analyzed. FTIR microscopy allows for the identification of particle as small as 10 µm. Determination of unknown materials is facilitated by spectral matching to a library of over 250,000 reference spectra.
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Cross Sections and Metallography
Rocky Mountain Laboratories, Inc.
Cross sections are prepared by mounting samples in epoxy and then grinding and polishing the mount for imaging in the optical microscope or Scanning Electron Microscopy (SEM). Valuable information from cross sectioning can include: film thicknesses, inclusions, corrosion thickness, dimensional verification, and subsurface defects. Metallographic cross sections are typically etched to reveal the microstructure. Microstructural analysis can provide information about heat treatment history, corrosion susceptibility, as well as undesirable microconstituents.
