Angstrom Sun Technologies, Inc.

Angstrom Sun Technologies Inc., headquartered in Boston, USA, is a privately held company specializing in affordable optical solutions. Our focus is on providing cost-effective tools for characterizing various parameters such as thin film thickness, thick coating thickness, wafer thickness, gap thickness, optical properties (refractive index N and extinction coefficient K), surface behavior, interface behavior, alloy concentrations, and their uniformities across surfaces. Our range of tools includes spectroscopic reflectometers, microspectrophotometers, microreflectometers, film thickness mapping systems, simple desktop film thickness stations, and automatic variable angle spectroscopic ellipsometers, as well as wafer and gap thickness tools. These tools are designed to offer advanced and high-performance capabilities at a low cost, allowing nondestructive and precise probing of film stacks and wafers. Additionally, we provide advanced analytical services for characterizing thin films, thick coatings, complex layer stacks, wafer thickness, TTV (Total Thickness Variation), and gap thickness. We also offer various vision products with USB directshow, USB3 vision, GigE, and GenTL compatible cameras.

  • 1 (978) 263-6678
  • 1 (978) 263-6675
  • info@angstec.com
  • 31 Nagog Park
    Acton,, MA 01720
    United States

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Showing results: 1 - 8 of 8 items found.

  • TFProbe Software

    Angstrom Sun Technologies, Inc.

    TFProbe software integrates system configuration, setup, data acquisition, regression analysis, data management and graph presentations all-in-one. Different user levels can be configured, like engineer mode, operator mode. TFProbe software can also be customized to have new functions to meet customer's special applications.

  • Spectroscopic Reflectometer

    SR Series - Angstrom Sun Technologies, Inc.

    Spectroscopic reflectometer (SR) series are relative low cost and easy to use tools. To enusre accurate measurement on spectra, a long working distance and also adjustable working distance set up are professionaly desgined and considered. Since reflection spectra measurments require to use known reference to calibrate light intensity, it is hard to image user could get accurate spectra without optimizing signal step during such calibration because reference thickness is different from sample substrate's thickness in most of cases. Adjusting power output to lamp is our another consideration in ensuring a good measurement by reducing non-linearity effect of the detector

  • Integrated In-Line Meterology

    Angstrom Sun Technologies, Inc.

    Although table-top version is our major product platform, we do provide in-line and in situ solutions. Although all in-line tools involve some special configuration and customized designs, we have had such experience to demo our capability in semiconductor, photovoltaic, glass industries. Both spectroscopic ellipsometer and spectroscopic reflectometers could be integrated for in-line or in situ application purpose. But how to implement them, or which one is more suitable, an environmental situation should be considered. You are welcome to discuss with our experts and we'll be glad to offer a real solution to meet your needs.

  • DUV-VIS-NIR Light Source

    Angstrom Sun Technologies, Inc.

    Angstrom Sun Technologies Inc Introduced high performance DUV-Vis-NIR light source for photometry and ellipsometry applications. This light source covers from 190 to 2500nm wavelength range, with capaility to remote control from computer program with TTL level signals. Dual lamp design offers balanced intensity output. Integrated timer provides conveneience to replace lamps per lamps' lifetime...

  • Film Thickness Mapping Systems

    Angstrom Sun Technologies, Inc.

    When you need processed thin film uniformity information, our SRM series mapping tool is for your consideration. SRM series allow you to map film thickness and refractive index up to 5 layers. No need to worry about complicated equipment since the SRM300 is easy to setup and operate. It uses Windows based software, so most people are already familiar with the look and feel of the operating system.

  • Microspectrophotometer

    MSP Series - Angstrom Sun Technologies, Inc.

    Microspectrophotometry (Micro-Photometry, Micro Spectrophotometry) is used to characterize optical properties of thin films, thick coatings over a micron region area. Microspectrophotometer is also called microreflectometer, micro-reflectometer, microspectrometer, microphotometer (Spectroscopic), microspectroscopic photometer etc.

  • TFProbe Wafer Measurement Tools

    Angstrom Sun Technologies, Inc.

    Angstrom Sun Technologies Inc offers optical measurement and inspection systems for semiconductor and related industries. Its core products include wafer measurement systems, spectroscopic ellipsometers, thin film reflectometers, and microspectrophotometers.TFProbe wafer measurement systems, TFProbe WM series, measure wafer thickness, warp, bow, flatness, step/bump height, trench depth. TFProbe WM systems are based on confocal optical method with advantages of non-contact, non-destructive, long working distance, fast data acquisition, full mapping functions. Particularly, with integration with our thin film measurement technique, a total solution for thickness measurement covers from a few angstroms to several millimeters. Another key feature is that all our tools are upgradable in future.

  • Spectroscopic Ellipsometer

    SE Series - Angstrom Sun Technologies, Inc.

    Spectroscopic Ellipsometer SE series are advanced models built by Angstrom Sun Technologies Inc. There are many more advantages over reflectometers due to its capability to acquire more set of polarization information at different incident angles spectroscopically. User can select two different data acquisition mode, scanning wavelength by wavelength detecting mode or array based fast detecting mode. Thanks for newly developed, mature array based detecting techniques, advanced data acquisition and processing algorithm, users are able to choose array based systems to have the same precision as scanning single element configurations. When a fast measurement is must, especially for real time in-situ measurement, mapping across big surface like wafers, array based configuration is always recommended. You are always welcome to discuss with us on your applications and we'll ensure the final configuration will meet your needs.

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