Nano-View Co. Ltd.
Nano-View is developing and producing the state of the art equipments that can measure analyze the thickness, optical properties, composition ratio and the surface roughness of the semiconductor, conductor, dielectric and liquid thin films that are used in semiconductor devices, LCD Display and solar cell.
- 82-31-400-3818~9
- 82-31-400-3817
- 508 HBI, Hanyang University
Sa-3dong, Sangrog-gu
Ansan, Gyeonggi-do 426-791
Korea, South
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product
Customized Ellipsometers
~0.1 nm thickness difference can be seen by IE-1000.Thickness distribution of thin film can be imaged.Thickness and optical images of semiconductor device, display, and bio samples.IE-1000 can show the images which can not be seen by conventional microscope.Defect of semiconductor and display can be seen directly.Easy and fast operation.
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product
Spectroscopic Reflectometer
– Antireflective coating (ARC) on textured (poly-) crystalline silicon solar cellMeasurement– Thickness, Reflectivity, n&kWavelength– 420 – 950 nm (1.3-3.0 eV) : expandableAccuracy (thickness measurement on specular sample)– 104.5 nm for 104.8 nm SiO₂on c-Si* Accuracy can be dependent on the quality of filmThickness range– 10 nm ~ 20 mm (depend on sample)Data acquisition time– < 1 sBeam spot size– ~ 50 mmFocusing of beam– Manual (optional auto-focus)Sample stage– Manual X-Y stage (specify sample size and travel distance)(optional automatic X-Y stage for mapping)
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product
Spectroscopic Ellipsometers
SE Series
Spectroscopic data measurement– Visible range: 350~840 nm (or 1.5~3.5 eV)– Data acquisition speed: 5 sec for full spectra of {Δ, Ψ}Manually variable angle of incidence– 45°~90° with 5° stepSingle body system– 40 cm (W) × 30 cm (D) × 30 cm (H), 15 kg (typical)* UV- option requires external lamp power supplyEasy operation– No set-up / No keys to control– Low maintenanceUser-friendly software– operation and analysisOther features– Sample stage with tilt & height adjustmentssample size: (5 mm × 5 mm) ~ (200 mm × 200 mm)– Computer with current operating softwareOptions– Mapping stage: manual or automatic– UV-option: 250~840 nm (or 1.5~5.0 eV)
