Plasma Emission Controller

The optical technology developed by HORIBA and the gas control technology offered by HORIBA STEC have been combined to make further advances in plasma control technology. The plasma emission controller RU-100 offers; faster deposition by controlling the transition region, optimized distribution in a large-area, high-capacity chamber, plasma stabilization in a long sputtering process (stable deposition), and mixture optimization of compounds for reactive sputtering.

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Topics

Plasma
Controllers
Emission
Process Control
Gas Emission
Process Controllers
Control
Deposition
Chambers
Optical