Plasma CVD & Etching Systems

MODEL DRIE-1000 - TEK-VAC INDUSTRIES Inc. (TEK-VAC INDUSTRIES Inc.)

A High Quality Plasma Deposition & Etch System, Ideal for R&D and Small Scale Production. Modified designs with capabilities of 12" wafers.
Substrate heating to 500 C.
Top loading / Optional loadlock.
Multifunctional plasma network.
Diversified pumping configurations.
Variable electrode spacing.
Customized features and components for specific applications.