Film Metrology System

Film Metrology System

The SpectraFilm™ F1 film metrology system helps chipmakers achieve strict process tolerances at sub-7nm logic and leading-edge memory design nodes by providing high-precision thin film measurements for a broad range of film layers including advanced multilayer film stacks like high-k metal gate. The high brightness light source drives the SpectraFilm F1’s spectroscopic ellipsometry technology and enables characterization and monitoring of advanced film stacks, while providing the signal required to accurately measure the bandgap and provide insight into electrical performance weeks earlier than e-test.