Low/Mid-Frequency Power Systems

Advanced Energy’s low- and mid-frequency power supplies offer highly efficient, easy-to-integrate power. Quickly improve process control in a wide variety of applications.

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Plasma Power Generators

Advanced Energy

Advanced Energy’s field-proven, Precision PowerTM solutions offer extreme control, peerless arc handling, and cutting-edge match technology. Unlock new fabrication processes and benefit from our plasma power generators’ comprehensive capabilities.

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DC Power Source Systems

Advanced Energy

Looking for a proven, precise DC power source? Advanced Energy offers standard DC and pulsed-DC power-delivery options. Thanks to vast feature sets and reliable performance, our DC power generators are used in nearly every manufacturing market — semiconductor, flat panel, glass, thin film, etc. And via our global, dedicated support staff, we make sure you get the right DC power product for your processes and applications.

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RF Match Networks

Advanced Energy

Enable fast, accurate, and reliable matching. Advanced Energy’s match networks expertly perform in multiple power ranges. Available in plug-and-play models or configurable units, easily install, expedite tuning, and tighten process control.

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RF Plasma Generators

Advanced Energy

Choose from a broad range of RF plasma generators and access unique features for configuration, control, and application requirements. From various mounts and sizes to full digital control and plasma dynamic response, our RF generators can ignite your process innovation.

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Pulsed-DC Systems

Advanced Energy

Extend process innovation with Advanced Energy’s comprehensive pulsed-DC suite. Minimize arcing, enhance deposition rate, improve film flatness and packing density.

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Advanced Dual-Magnetron Sputtering Accessories

Ascent DMS - Advanced Energy

The Ascent® DMS series offers unprecedented power-delivery ease and control for dual-magnetron sputtering, enabling precise tuning of film characteristics. With selectable frequency, regulation mode, and duty cycle, as well as low stored energy and simplified, modular system configuration, the Ascent DMS accessory distinguishes itself as truly next-generation technology. Cost-effective, scalable, and versatile, it minimizes complexity, increases quality, and boosts throughput to enable advanced process innovation. The Ascent DMS MF-120 package provides cost-effective, mid-frequency power for standard cathodes, while delivering bipolar pulsing technology benefits.

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Low/Mid-Frequency Power Systems

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Plasma Power Generators

DC Power Source Systems

RF Match Networks

RF Plasma Generators

Pulsed-DC Systems

Advanced Dual-Magnetron Sputtering Accessories