Ar Gas Cluster Ion Source

GCIS - Kratos Analytical Ltd

The Kratos Ar Gas Cluster Ion Source (GCIS) is optimised for depth profiling organic materials in Arn+ cluster mode and inorganic materials in Ar+ monomer mode, dependent on the operating parameters defined by the user and the type of material to be profiled. In Arn+ ion cluster mode the ions can be accelerated up to a maximum of 20 keV. This enables the successful sputter depth profiling of the widest range of polymer materials to be undertaken. However, Arn+ cluster depth profiling has been shown to give very low sputter yields for inorganic materials. In order to retain the capability of generating depth profiles from this class of materials this ion source can also be operated in the more conventional Ar monomer (Ar+) mode.