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Reticle Defect Inspection Systems for Mask Shops

Reticle Defect Inspection Systems for Mask Shops

The Teron 640e reticle inspection product line advances the development and qualification of leading-edge EUV and 193 patterned reticles in mask shops by detecting critical pattern and particle defects. Using die-to-database or die-to-die modes, these inspection systems are designed to handle the wide range of stack materials and complex OPC structures characteristic of the latest 7nm and 5nm device nodes.

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