Ultra-High Vacuum
KP Technology offer a range of Kelvin Probes that work under ultra-high vacuum conditions, choose from single-point or scanning probes to add to your existing vacuum chamber, customize the UHV corner cube or consider the newest addition to the range, the Ф4 ultra-high vacuum scanning Kelvin Probe system.
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Ultra-High Vacuum Kelvin Probe
Our Ultra-high Vacuum Kelvin Probes give the user full access to work function and contact potential difference (CPD) measurements under vacuum. Each system comes with a high-quality, manual, or motorized translator that enables reliable and accurate tip-to-sample positioning, and the unrivalled tracking system always holds the tip separation constant during the measurement. Even under vacuum, the work function resolution is 1 - 3 meV.
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Ultra-High Vacuum Scanning Kelvin Probe
Our Ultra-high Vacuum Scanning Kelvin Probes (UHVSKP2020 and UHVSKP5050) give the user full access to work function (Φ) and contact potential difference (CPD) measurements under vacuum with the ability to scan a sample area of 20 x 20mm or 50 x 50mm respectively. Each system comes with the UHV head unit, tip amplifier (located at the mounting port), digital control unit and host PC with dedicated software. The tip can be retracted 100mm from the sample and approaches normal to the sample. The associated digital electronic unit powers the head unit and provides an interface between the head unit and the data acquisition system. The system comes with a complete user manual, which includes an introduction to work function measurements and a detailed description of the system software, including examples. The work function resolution of the Ultra-High Vacuum Scanning Kelvin Probes is 1-3 meV.
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Ultra-High Vacuum Ф4 Scanning Kelvin Probe
The Ф4 Ultra-high Vacuum Scanning Kelvin Probe system gives the user full access to work function measurements under vacuum with the ability to alter the temperature from 77 K to 860 K. The Kelvin Probe measurement has resolution of 1 - 3 meV for a 2 mm tip on a conducting sample. The sample is mounted on a plate that is located on a motorized (x, y, z) translator attached to a stainless-steel vacuum chamber. Phi 4 also comes with a photoemission spectroscopy system with a tuneable source (3.4 - 7.0 eV). The deep ultra-violet (DUV) light spot measures approximately 3 x 4 mm. Absolute work function measurements can be obtained with this system in the range of 4.0 - 6.5 eV with an accuracy of 0.05 - 0.1 eV.
