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Showing results: 1336 - 1342 of 1342 items found.

  • HF/HNO3 Monitor

    CS-153N - HORIBA, Ltd.

    The CS-153N is a high-precision chemical solution concentration monitor designed to meet the strict demands of semiconductor wet-etching processes. Etching processes use HF/HNO3 solution to etch silicon oxide and remove particles from the wafer surface. The CS-153N continually monitors each component of the HF/HNO3 solution (HF/HNO3/H2O), alerting the user each time the solution is replaced or replenished. This allows you to maintain the concentration of the HF/HNO3 solution within the tolerance range, while eliminating unnecessary solution replacement.

  • SC-1 Monitor

    CS-131 - HORIBA, Ltd.

    The CS-131 is a high-precision chemical concentration monitor designed for use with SC-1 solutions used in cleaning processes during semiconductor manufacturing. It offers a faster response speed in a more compact size than anything available to date. The CS-131 monitors the concentrations of the individual components of the SC-1 solutions (NH3/H2O2/H2O) which is widely used to remove particles and organic substances. The monitor has a number of outputs which can be utilized to keep the concentrations of the individual elements of the SC-1 solutions within the allowable ranges; this eliminates unnecessary replacement of chemicals potentially increasing bath life time and reducing chemical cost. In addition, a model with an integrated cooling unit is available, allowing accommodation of a broader range of sample temperatures.

  • BHF Concentration Monitor

    CS-137 - HORIBA, Ltd.

    The CS-137 is a high-precision chemical solution concentration monitor designed to meet the strict demands of semiconductor wet-etching processes. Etching processes use BHF solution to etch silicon oxide and remove particles from the wafer surface. The CS-137 continually monitors each component of the BHF solution (NH4F/HF/H2O), alerting the user each time the solution is replaced or replenished. This allows you to maintain the concentration of the BHF solution within the required component ranges, while eliminating unnecessary solution replacement.

  • Variable Reluctance Pressure Sensor Capable of Range Changes

    DP15 - Validyne Engineering

    An easy-to-replace pressure-sensing diaphragm maximizes the system's functionality by making pressure measurements from 2.22" H2O to 3200 psi in one compact unit. Rugged and reliable, the DP15 pressure sensor provides superior accuracy for measuring low-pressure liquids and gasses, while it withstands the abuse of field and laboratory testing. The ability to change full scale ranges make the DP15 a very cost effective solution for applications that need different pressure ranges or university labs.

  • CH4/CO2/H2O Trace Gas Analyzer

    LI-7810 - Li-Cor Environmental, Inc.

    The LI-7810 CH4/CO2/H2O Trace Gas Analyzer offers high performance methane measurements in a durable, portable design. This makes the LI-7810 a great fit for survey or long-term measurements of soil CH4 fluxes.

  • N2O/H2O Trace Gas Analyzer

    LI-7820 - Li-Cor Environmental, Inc.

    The LI-7820 N2O/H2O Trace Gas Analyzer offers high-precision nitrous oxide measurements in a low power, portable design—enabling it to easily integrate into survey and long-term soil flux systems. Pair it with the LI-7810 CH4/CO2/H2O Trace Gas Analyzer or LI-870 CO2/H2O Analyzer for CO2 and CH4 measurements at your site.

  • Eddy Covariance Systems

    Li-Cor Environmental, Inc.

    LI-COR eddy covariance systems measure the exchange of CO2, H2O, CH4 , and energy between the earth's surface and the atmosphere, empowering researchers to advance scientific understanding of climate and ecosystem dynamics.

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