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Thin Film
layer of material ranging < a nanometer to > a micrometer in thickness.
See Also: Film, Ellipsometers
- Pickering Interfaces Inc.
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Resistance Temperature Detectors (RTD) Simulators
Simulation of resistance based temperature sensors such as positive or negative temperature coefficient thermistors. Resistance Temperature Detectors (RTDs) can be wire-wound or thin film. Our RTD simulator modules provide a cost-effective method of simulating both PT100 and PT1000 RTD sensor types that require fine setting resolution.
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C-Band 1510nm BWDM
WD1510
Hangzhou Huatai Optic Tech. Co., Ltd.
WD1510 WDM is based on mature thin film filtering tech, with wide bandwidth, flatness, low insertion loss and high isolation. It is mainly applied to WDM network to achieve the combination and separation of C-Band 1510nm (±10nm, monitor and control channel).
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C-Band / L-Band MWDM
WD1615/C, WD1516/L
Hangzhou Huatai Optic Tech. Co., Ltd.
WD1615/C, WD1516/L WDM is based on mature thin film filtering tech, with wide bandwidth, flatness, low insertion loss and high isolation. It is mainly applied to EDFA and DWDM network to achieve the combination and separation of C-Band and L-Band.
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C-Band Red/Blue-Band Pass MWDM
WD1515/R, WD1515/B
Hangzhou Huatai Optic Tech. Co., Ltd.
WD1515/R, WD1515/B is based on mature thin film filtering tech, with wide bandwidth, flatness, low insertion loss and high isolation. It is mainly applied to the combination and separation of C-Band, Red-Band (1547~1563nm) and Blue-Band (1528~1543nm).
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Ceramic Process Carrier Pallets
Ceramic engineering specializing in Silicon Carbide, Boron Carbide, Alumina, Zirconia and Lead Zirconate Titanate (PZT) based ceramics, composites and thin films for High Strength, high temperature, semiconductive ceramic designed for use in wafer fabrication or hybrid circuits in vapor deposite ovens. Test Electronics will precision drill and customize pallets for your circuit board. Click on the Quote tab on the left then click on the Carrier Pallets tab to get an instant quotation on your process carrier pallets.
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Compact Passive and Active Resistor Trimming for Thick and Thin Film
LRT 2000C
*Travel: 6" x 6"*Laser : Fiber Laser Ytterbium 1064 nm*Kerf: 30 to 80 micron Adjustable*Pulse width : 80 nano second*Rap Rate: 1 to 1 million Pulse Per Second*Average Power: 20 watts
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Customized Ellipsometers
~0.1 nm thickness difference can be seen by IE-1000.Thickness distribution of thin film can be imaged.Thickness and optical images of semiconductor device, display, and bio samples.IE-1000 can show the images which can not be seen by conventional microscope.Defect of semiconductor and display can be seen directly.Easy and fast operation.
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CWDM Mux/Demux in 1U Rackmount(4,8,16,18-Channel)
Flyin Optronics’ Coarse wavelength division multiplexer (CWDM Mux/Demux) utilizes thin film coating technology and proprietary design of non-flux metal bonding micro optics packaging. It provides low insertion loss, high channel isolation, wide pass band, low temperature sensitivity and epoxy free optical path.
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CWDM Mux/Demux in LGX Box(4,8,16,18-Channel)
Flyin Optronics’ Coarse wavelength division multiplexer (CWDM Mux/Demux) utilizes thin film coating technology and proprietary design of non-flux metal bonding micro optics packaging. It provides low insertion loss, high channel isolation, wide pass band, low temperature sensitivity and epoxy free optical path.
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CWDM Mux/Demux Module（4,8,16,18-Channel）
Flyin Optronics’ Coarse wavelength division multiplexer (CWDM Mux/Demux) utilizes thin film coating technology and proprietary design of non-flux metal bonding micro optics packaging. It provides low insertion loss, high channel isolation, wide pass band, low temperature sensitivity and epoxy free optical path.
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CWDM OADM Module(4,8,16,18-Channel)
Flyin Optronics' Coarse wavelength division multiplexer (CWDM Mux/Demux) utilizes thin film coating technology and proprietary design of non-flux metal bonding micro optics packaging. It provides low insertion loss, high channel isolation, wide pass band, low temperature sensitivity and epoxy free optical path.
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DLC-X Diamond-Like Carbon System
Deposit dense, uniform, and repeatable thin, diamond-like carbon (DLC) films for longer-lasting TFMH slider overcoats and landing pads with Veeco's NEXUS DLC-X System. The Nexus DLC-X features the industry's first production-worthy Pulsed Filtered Cathode Arc Source to enable sub-20A overcoat thickness, and supports improved step coverage for better process yield compared to previous generations.
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Ellipsometer
alpha-SE®
For routine measurements of thin film thickness and refractive index, this ellipsometer allows you to mount a sample, choose the model that matches your film, and press "measure". You have results within seconds. Works with your materials - dielectrics, semiconductors, organics, and more.
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Flashlight Solar Simulator
Flashlight Solar Simulators have the advantage of negligible temperature change to the solar cell. For this reason, they are primarily used in cell and module production environments. Also, they are a more budgetary alternative if large cell areas are to be illuminated, because it is easier to have excellent light uniformity on areas of 8 in x 8 in or larger. So, this type of solar simulator is also used for analysis of large area thin film solar cells. But care must be taken, as some materials (e.g. CIGS) have long inherent time constants, so that the pulse length (better: flash plateau) must be chosen accordingly.
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Fully Integrated Modular Ozone Delivery System
SEMOZON® AX8580
The SEMOZON® AX8580 Ozone Delivery System generates and delivers high flow, high concentration, ultra-clean ozone for advanced thin film applications. The SEMOZON AX8580 is specifically designed for use with an increasing number of semiconductor process applications such as ALD, CVD and TEOS/Ozone CVD.
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FWDM Module
Flyin Optronics' Micro-Optical WDM utilizes thin film coating technology and proprietary design of non-flux metal bonding micro optics packaging. It provides low insertion loss, high channel isolation, low temperature sensitivity and epoxy free optical path.
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GHW Series 13.56 MHz, 1.25, 2.5, And 5.0 KW High-Reliability RF Plasma Generators
The GHW Series RF power generators deliver maximum rated output powers of 1250, 2500 and 5000 Watts at a frequency of 13.56 MHz. The GHW generators offer field-proven reliability, exceptional stability, and unsurpassed repeatability for high uptime and process yield. They are ideally suited for Plasma Enhanced Chemical Vapor Deposition (PECVD), High Density Plasma CVD (HDPCVD), etching and other thin film applications during the manufacture of integrated circuits, flat panel displays, and data storage devices.
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High Isolation 1310/1550nm WDM
HWD1315
Hangzhou Huatai Optic Tech. Co., Ltd.
HWD1315 high isolation WDM is based on mature thin film filtering tech, metal sealing technology package. HWD1315 is used in combination and separation of 1310nm and 1550nm band optical signal. Its wide bandwidth, flatness, low insertion loss and isolation are higher than the average MWDM devices and so on.
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Infrared Sensors
IR9901 and 9902
The Smartec infrared sensor SMTIR9901 and SMTIR9902 are sophisticated full silicon infrared sensors and comprise of so called thermopiles. Thermopiles are based on the Seebeck effect, which is a long time standard for conventional thermocouples. The application of thin film technology allows the production of miniaturised and low cost sensor elements.
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L-Band Red/Blue-Band Pass MWDM
WD1616/R, WD1616/B
Hangzhou Huatai Optic Tech. Co., Ltd.
WD1616/R, WD1616/B is based on mature thin film filtering tech, with wide bandwidth, flatness, low insertion loss and high isolation. It is mainly applied to the combination and separation of L-Band, Red-Band (1589~1603nm) and Blue-Band (1570~1584nm).
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Low Voltage Holiday Detector
M1-AC
For use such as: Coatings, in-plant environments, rebar, pipelines, sheet materials coated with thin film under 20milsa,
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Materials Metrology
Nova Measuring Instruments Inc.
Nova is a market leader for innovative thin film metrology and process control technologies. We develop highly sensitive in-line metrology solutions on high productivity platforms, thereby enabling critical metrology solutions to be closer to a semiconductor fab’s process and integration needs.Our technologies enable customers to accurately detect and quantify small variations in film composition and thickness, thereby influencing better device functionality, and improved manufacturing yield.
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Metrology Solutions for Semiconductors
Bruker Semiconductor develops, manufactures, markets, and supports metrology solutions for thin films, which are based on novel, rapid, non-contacting and non-destructive X-ray technology. With Bruker’s acquisition of Jordan Valley Semiconductors, a name synonymous with unparalleled worldwide customer service and support, 75% of the world's top 25 semiconductor manufacturers rely on Bruker metrology tools for front-end and back-end applications, including development of their next-generation thin films. Bruker commitment to innovation and technology leadership drives the continued release of new advancements in metrology, and has garnered numerous awards and industry recognition.
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Microscope Spectrophotometer
508 PV
The 508 PV™ Microscope Spectrophotometer is designed to add spectroscopy, color imaging, thin film thickness measurement and colorimetry capabilities to your optical microscope or probe station. It can also be used to upgrade an older microspectrometer with cutting edge optics, electronics and software.
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Microwave Dielectric Measurement Systems
This system enables fast and non-destructive measurements of materials having various shapes, including thin films. Enables fast and non-destructive measurement of permittivity of thin-films and various dielectric materials using the evanescent mode of an open coaxial resonator.
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Multi-Element Standards
These multi-element standards consist of multi-layer thin film coatings, one on top of the other, upto a maximum of 6 elemental coatings. It is generally recommended to have coating thicknesses < 20 µg/cm2, so as to cause negligible notable matrix effects, in particular absorption of X-rays emitted in lower deposits by those covering them.
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Passive and Active Resistor Trimming for Thick and Thin Film
LRT 2000L
*Travel: 6" x 6"*Laser : Fiber Laser Ytterbium 1064 nm*Kerf: 30 to 80 micron Adjustable*Pulse width : 80 nano second*Rap Rate: 1 to 1 million Pulse Per Second*Average Power: 20 watts*Target: Electric crosshair on monitor
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Pressure Measurement Film
Prescale
Prescale allows you to easily measure pressure balance, distribution, and size. Created using Fujifilm's advanced thin film coating technologies, the pressure inspection sensor on the entirety of the film allows you to confirm pressure distribution of the entire surface at a glance. The color appears red where pressure is applied, and the color density varies according to the amount of pressure. To cover a wide pressure range (0.006 to 300 MPa), we supply eight types and nine variations of Prescale.
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Proton Induced X-ray Emission (PIXE)
Elemental Analysis Incorporated, utilizing Proton Induced X-ray Emission (PIXE), provides a non-destructive, simultaneous analysis for the 72 inorganic elements from Sodium through Uranium on the Periodic Table for solid, liquid, and thin film (i.e. aerosol filter) samples. The PIXE technique offers the advantage of analysis, without the necessity for time consuming digestion, thereby minimizing the potential for error resulting from sample preparation.
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Reflectance Standards
STAN Series
Ocean Optics offers specular reflectance standards for measuring shiny surfaces such as machined metals and semiconductor materials and low-reflectivity surfaces such as anti-reflective coatings and thin film coatings. The STAN-SSH varies in reflectivity from 87%-98% over the 200-2500 nm wavelength range and is available in a version (STAN-SSH-NIST) calibrated to a NIST master standard. The NIST calibration data range is 250-2500 nm.
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Remote Plasma Sources
Semiconductor and Electronic Thin Film applications use plasma sources to generate low-energy ions and radicals to react with material surfaces and chamber walls to remove contaminants and act as a precursor to aid in material deposition. MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries.
