Showing results: 1 - 15 of 31 items found.
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T-Solar™ -
J.A. Woollam Co., Inc.
The T-Solar ellipsometer combines the best photovoltaic measurement technology into a single system designed specifically for textured samples. Based on the establishedM-2000 rotating compensator spectroscopic ellipsometer, the T-Solar measures hundreds of wavelength across the UV-Visible-NIR.
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MARY-102 -
FiveLab Co.,Ltd.
Ellipsometer is optical instruments which measure the change in polarizationstate of light beam upon reflection from a sample surface to analyzethe film thickness, the optical constants as the refractive index / absorption,or the optical constants of bulk materials.
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FiveLab Co.,Ltd.
Ellipsometer is optical instruments which measure the change in polarizationstate of light beam upon reflection from a sample surface to analyzethe film thickness, the optical constants as the refractive index / absorption,or the optical constants of bulk materials.
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alpha-SE® -
J.A. Woollam Co., Inc.
For routine measurements of thin film thickness and refractive index, this ellipsometer allows you to mount a sample, choose the model that matches your film, and press "measure". You have results within seconds. Works with your materials - dielectrics, semiconductors, organics, and more.
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RC2 -
J.A. Woollam Co., Inc.
The RC2 design builds on 25 years of experience. It combines the best features of previous models with innovative new technology: dual rotating compensators, achromatic compensator design, advanced light source and next-generation spectrometer design. The RC2 is a near-universal solution for the diverse applications of spectroscopic ellipsometry.
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PH-SE -
HenergySolar
The spectroscopic ellipsometer is used for thin film and material characterization in R & D. The spectroscopic ellipsometer is designed to meet the requirements in modern research with special emphasis on speed and accuracy for an unmatched variety of applications.
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SENTECH Instruments GmbH.
The laser ellipsometer can be utilized to characterize single films and substrates from selectable, application specific angles of incidence.
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SENresearch 4.0 -
SENTECH Instruments GmbH.
The SENresearch 4.0 is the new SENTECH spectroscopic ellipsometer. Every individual SENresearch 4.0 spectroscopic ellipsometer is a customer-specific configuration of spectral range, options and field upgradable accessories. SENresearch 4.0 uses fast FTIR ellipsometry for the NIR up to 2,500 nm or 3,500 nm, respectively. It provides broadest spectral range with best S/N ratio and highest, selectable spectral resolution. Silicon films up to 200 µm thickness can be measured. The measurement speed of FTIR ellipsometry compares to diode array configurations, which are also selectable up to 1,700 nm. The new motorized Pyramid Goniometer features an angle range from 20 deg to 100 deg. Optical encoders ensure highest precision and long term stability of angle settings. The spectroscopic ellipsometer arms can be moved independently for scatterometry and angle resolved transmission measurements.
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M-2000 -
J.A. Woollam Co., Inc.
The M-2000 line of spectroscopic ellipsometers is engineered to meet the diverse demands of thin film characterization. An advanced optical design, wide spectral range, and fast data acquisition make it an extremely powerful and versatile tool.
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IR-VASE® -
J.A. Woollam Co., Inc.
The IR-VASE is the first and only spectroscopic ellipsometer to cover the spectral range from 2 to 30 microns (333 to 5000 wavenumbers). The IR-VASE can determine both n and k for materials over the entire width of the spectral range without extrapolating data outside the measured range, as with a Kramers-Kronig analysis.
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SE Series -
Angstrom Sun Technologies, Inc.
Spectroscopic Ellipsometer SE series are advanced models built by Angstrom Sun Technologies Inc. There are many more advantages over reflectometers due to its capability to acquire more set of polarization information at different incident angles spectroscopically. User can select two different data acquisition mode, scanning wavelength by wavelength detecting mode or array based fast detecting mode. Thanks for newly developed, mature array based detecting techniques, advanced data acquisition and processing algorithm, users are able to choose array based systems to have the same precision as scanning single element configurations. When a fast measurement is must, especially for real time in-situ measurement, mapping across big surface like wafers, array based configuration is always recommended. You are always welcome to discuss with us on your applications and we'll ensure the final configuration will meet your needs.
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Nano-View Co. Ltd.
~0.1 nm thickness difference can be seen by IE-1000.Thickness distribution of thin film can be imaged.Thickness and optical images of semiconductor device, display, and bio samples.IE-1000 can show the images which can not be seen by conventional microscope.Defect of semiconductor and display can be seen directly.Easy and fast operation.
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SE Series -
Nano-View Co. Ltd.
Spectroscopic data measurement– Visible range: 350~840 nm (or 1.5~3.5 eV)– Data acquisition speed: 5 sec for full spectra of {Δ, Ψ}Manually variable angle of incidence– 45°~90° with 5° stepSingle body system– 40 cm (W) × 30 cm (D) × 30 cm (H), 15 kg (typical)* UV- option requires external lamp power supplyEasy operation– No set-up / No keys to control– Low maintenanceUser-friendly software– operation and analysisOther features– Sample stage with tilt & height adjustmentssample size: (5 mm × 5 mm) ~ (200 mm × 200 mm)– Computer with current operating softwareOptions– Mapping stage: manual or automatic– UV-option: 250~840 nm (or 1.5~5.0 eV)
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CER – SE 500adv -
SENTECH Instruments GmbH.
* The SE 500adv combines ellipsometry and reflectometry, * Eliminates the ambiguity in layer thickness determination for transparent films, * Extends thickness measurement to 25000 nm. # Laser wavelength 632.8 nm# Spectral range of reflectivity from 450 nm to 920 nm wavelength# Spot size 80 ?m
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PH-ASE -
HenergySolar
The PH-ASE spectroscopic ellipsometer measures thickness, refractive index and extinction coefficient of single films and multilayer stacks. Reflection measurements at different incident angles and transmission measurements can be carried out and combined with ellipsometric data.