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Current Sensing Resistors: ACQ-200
TCS
These components are four-terminal. bus-bar, metal strip current shunts. Assembled using electron beam welding. These units can handle 15W of continuous power and a maximum current of 350A 90.1mohm). Also they can absorb a high pulse power rating and have very low inductance. They also feature excellent long term stability, less than 100ppm/C TCR, and have excellent frequency characteristics.
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A Highly Versatile R&D Bell Jar Thin Film Coating System.
MODEL VES-3000
TEK-VAC's VES-3000 coater station model offers a modular concept for thin film deposition. Common PVD techniques which can be employed in this compact unit include thermal and electron beam evaporation. A 2KVA SCR controlled filament evaporation power supply is provided. Optional ion deposition and magnetron sputtering devices can be incorporated in the system.
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TEM Lamella Preparation And Volume Imaging Under Cryogenic Conditions
ZEISS Correlative Cryo Workflow
ZEISS Correlative Cryo Workflow connects widefield, laser scanning, and focused ion beam scanning electron microscopy in a seamless and easy-to-use procedure. The solution provides hardware and software optimized for the needs of correlative cryogenic workflows, from localization of fluorescent macromolecules to high-contrast volume imaging and on-grid lamella thinning for cryo electron tomography.
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Focused Ion Beam Scanning Electron Microscopes
FIB-SEMs
Combine imaging and analytical performance of a high resolution field emission scanning electron microscope (FE-SEM) with the processing ability of a next-generation focused ion beam (FIB).
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Hi Rate Multi-Pixel Detection
Systems utilizing multiple electron beams are an emerging semiconductor metrology technology that aims to increase throughput. El-Mul is a pioneer in developing detection solutions for such metrology systems and has designed and manufactured prototype detectors that can simultaneously detect 144 beams at 35MHz.
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Scanning Electron Microscopes
SEM
Scanning Electron Microscopes (SEM) scan a sample with a focused electron beam and obtain images with information about the samples’ topography and composition.
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Electron Probe Microanalyzer
EPMA-8050G
This instrument is equipped with a cutting-edge FE electron optical system, which provides unprecedented spatial resolution under all beam current conditions, from SEM observation conditions up to 1 μA order. Integration with high performance X-ray spectrometers that Shimadzu has fostered through the company's traditions achieves the ultimate advance in analysis performance.
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X-Ray Systems
X-ray and radioactive devices developed by AET, are widely utilized for medical, industrial and research use. The Compact Pulse X-ray Source can accelerate electron beams in a high-gradient electric field, to produce X-rays. Dose Calibrators are utilized for radioactive examinations and treatments in the medical industry.
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PED Systems
Pulsed Electron Deposition
Is a process in which a pulsed (80-100 ns) high power electron beam (~1000 A, 15 kV) penetrates approximately 1 μm into the target resulting in a rapid evaporation of target material. The non-equilibrium heating of the target facilitates stoichiometric ablation of the target material. Under optimum conditions, the target stoichiometry is preserved in the deposited films. All solid state materials – metals, semiconductors and insulators, including those transparent to laser wavelengths in PLD – can be deposited as thin films with PED. By combining PLD and PED, the range of complex materials that can be prepared as thin films can be greatly enhanced.
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Electron Beam Lithography System
Spot type Electron Beam Lithography System JBX-8100FS achieved high throughput, small footprint and electric power saving.
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Microscopy Software/Hardware
ZEISS Atlas 5
Atlas 5 is your powerful hardware and software package that extends the capacity of your ZEISS scanning electron microscopes (SEM) and ZEISS focused ion beam SEMs (FIB-SEM). Use its efficient navigation and correlation of images from any source, e.g. light- and X-ray microscopes. Take full advantage of high throughput and automated large area imaging. Unique workflows help you to gain a deeper understanding of your sample.
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Breakthrough compressors for the GDSII and MEBES formats
GDZip + MEZip
Recognizing the challenge to transfer, manipulate, and store the exponentially-increasing size of IC design files, Solution-Soft has developed gdzip and mezip, breakthrough compressors for the GDSII and MEBES formats used by the industry. The MEBES format is the most commonly used format for electron beam lithography and photomask production. The GDSII stream is the standard exchange format between the design world and the mask shops.
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Magnetic Field Cancelling System
MR-3
3-axis magnetic field cancelling system for electron microscopes (SEM and TEM), electron and ion beam experiments, nanotechnology, biomagnetic investigations, etc. High reliability through rugged analog design. No tedious programming, no chrashs. More than 1000 MR-3 systems sold worldwide.
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Streak Tubes
Streak tubes are the most important modules of streak cameras used for the study of ultra fast optical phenomena. The latter cameras are tools of critical importance in many areas of science and technology like studies of plasma/electric discharge/ combustion/laser ablation/ condensed matter phenomenon, in optical communications, electron beam acceleration technology, photochemistry, medicine, biology etc. Streak cameras have made possible a series of important scientific discoveries in earlier mentioned areas of science and technology. Precision information about parameters of streak tubes is needed both by manufacturer of such tubes in improve tube design and by users of these tubes to correct data generated by the tubes and make possible more accurate interpretation of output images.
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XRT Source Brighthawk
The BRIGHTHAWK NT100 is a performance-leading microfocus X-ray tube comprising proprietary technology to achieve a high brightness output. The tube consists of a LaB6 crystal source for generation of the electron beam, a magnetic beam steering system, and a tungsten target for X-ray photon emission. The components are mounted in a precision-engineering housing and held at ultra-low vacuum levels for long-life performance. Following on from the successful 3rd generation tube, this 4th generation of tube across a wide energy range from 30 kV to 160 kV is highly configurable through a software interface to the internal control board, which is connected via an optical interface (through an Ethernet converter).
