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SEM
surface imaging from 1 to 5 nm in size.
See Also: Scanning Electron Microscopy, Scanning Electron Microscopes, EBSD
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Field Emission SEM
FESEM
Materials Evaluation and Engineering
The FESEM is an advanced microscope offering increased magnification and the ability to observe very fine features at a lower voltage than the SEM found in most laboratories.
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SEM- Based Dectors
ScintiFast™
ScintiFast™ is El-Mul’s flagship scintillator technology enabling the next generation of detectors with shorter response time and higher sensitivity. Recently released, ScintFast™ has the highest available photon yield for the nanosecond scintillator category. ScintiFast™ is the scintillator of choice for detectors in SEM-based tools for the semiconductor market as well as in Time of Flight Mass Spectrometry instruments.
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Scanning Electron Microscope (SEM)
Prisma E
Prisma E scanning electron microscope (SEM) combines a wide array of imaging and analytical modalities with new advanced automation to offer the most complete solution of any instrument in its class. It is ideal for industrial R&D, quality control, and failure analysis applications that require high resolution, sample flexibility and an easy-to-use operator interface. Prisma E succeeds the highly successful Quanta SEM.
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Scanning Electron Microscopy (SEM Analysis)
Rocky Mountain Laboratories, Inc.
Scanning Electron Microscopy (SEM Analysis) can produce images of almost any sample at magnifications of 15-300,000X. The SEM has tremendous depth of field allowing for imaging that cannot be accomplished using optical microscopy. Conductive and nonconductive samples can be imaged. When operated in the backscatter (BSE) detection mode, differences in material composition can be observed. Elemental analysis can be performed on any feature observed with an integrated Energy Dispersive Spectroscopy (EDS) detector.
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Scanning Electron Microscopes
SEM
Scanning Electron Microscopes (SEM) scan a sample with a focused electron beam and obtain images with information about the samples’ topography and composition.
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Scanning Electron Microscopy
SEM
Materials Evaluation and Engineering
JEOL JSM-6610 LV LaboratoryScanning electron microscopy (SEM) uses electrons for imaging to obtain higher magnifications and greater depth of field than light microscopes. The instruments at MEE are capable of variable-pressure, or low vacuum, SEM (VPSEM), as well as traditional high-vacuum conditions for sample observation. VPSEM is a specialized method using a variable-pressure sample chamber that allows direct evaluation of samples that are not readily examined with a traditional high-vacuum SEM. Nonconductive or vacuum sensitive samples that would typically require additional sample preparation can be directly analyzed in VPSEM without the need for additional sample preparation, such as carbon or metallic conductive coatings. This reduces both sample preparation time and distractions in microanalysis. Our laboratory also has a field emission SEM (FESEM) for critical high-magnification work and low-voltage (LVSEM) applications. Each instrument has a spacious sample chamber that can accommodate large and irregularly-shaped specimens and accessories for feature dimensional analysis and chemical microanalysis.
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Scanning Electron Microscope
Verios G4 XHR SEM
The Thermo Scientific™ Verios G4 scanning electron microscope (SEM) provides sub-nanometer resolution from 1 to 30 kV and enhanced contrast needed for precise measurements on materials in advanced semiconductor manufacturing and materials science applications, without compromising the high throughput, analytical capabilities, sample flexibility and ease of traditional Scanning Electron Microscope (SEM).
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Atomic Force Microscope for SEM/FIB
AFSEM® AFM Insert
AFSEM is an atomic force microscope (AFM), designed for integration in a SEM or Dualbeam (SEM/FIB) microscope. Its open access design allows you to simultaneously operate SEM and AFM inside the SEM vacuum chamber. The correlated image data of AFM and SEM enable unique characterization of your sample, and the combination of complementary techniques is a key success factor for gaining new insights into the micro and nano worlds. AFSEM enables you to easily combine two of the most powerful analysis techniques to greatly extend your correlative microscopy and analysis possibilities.
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Stand alone Software
MeX
MeX is a stand alone software package that turns any SEM with digital imaging into a true surface metrology device. Using stereoscopic images the software automatically retrieves 3D information and presents a highly accurate, robust and dense 3D dataset which is then used to perform traceable metrology examination. The results are obtained irrespective of the SEM magnification providing metrology at macro and micro levels. No additional hardware is necessary to run MeX and it can be used with any SEM. Due to the unique AutoCalibration routine the calibration data is automatically refined. Thereby only MeX enables traceable 3D measurements at any magnification in the SEM.
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Scanning Electron Microscope
SEM
Delivers the world's best resolution with the incorporation of the newly-developed, super-high resolution Gentle Beam (GBSH). In addition, the maximum probe current of the In-lens Schottky Plus gun has been increased from 200 nA to 500 nA.
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Electron Microscope Analyzer
QUANTAX EBSD
QUANTAX EBSD system, with its popular OPTIMUS 2 detector head, is the best available solution for analyzing nanomaterials in the SEM
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Energy Dispersive X-Ray Spectroscopy (EDS)
Rocky Mountain Laboratories, Inc.
Energy Dispersive Spectroscopy (EDS Analysis) is used in conjunction with the Scanning Electron Microscope (SEM) providing chemical analysis in areas as small as 1 µm in diameter. EDS detects all elements except for H, He, Li, and Be. EDS can be performed exactly on any features or particles seen in the SEM images and can “MAP” elements on a surface. Unknown materials can be identified and quantitative analysis can be performed.
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EBSD tools
EDAX EBSD tools provide leading performance and groundbreaking technology for analyzing crystallographic microstructure, using electron backscatter diffraction in the SEM.
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Electron Microscope Analyzer
QUANTAX WDS
The QUANTAX WDS (WDX) for SEM consists of the XSense wavelength dispersive spectrometer yielding the best resolution among all parallel-beam WDS systems.
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Spectroscopic Platform
Allalin
The Allalin is a nanometer resolution spectroscopy instrument, based on a disruptive technology known as quantitative cathodoluminescence that integrates a light microscope and a scanning electron microscope (SEM) into one tool.
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Semiconductor
Aerotech has a long history of engineering and manufacturing motion systems and components for high precision wafer processing, scanning electron microscopy (SEM), wafer bumping, 450 mm wafer manufacturing, lithography equipment and advanced laser micromachining. We also specialize in systems and components for vacuum applications, such as EUV lithography. So whether you need off-the-shelf wafer bumping components or a custom-engineered SEM system manufactured and tested to exacting specifications, Aerotech can provide the optimal solution for your application.
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RF Analyzer
Occupied Bandwidth (OBW)Adjacent Channel Power (ACP)Channel Power (CHP)Complementary Cumulative Density Function (CCDF) Intermodulation (IMD)Spectrum Emission Mask (SEM) IQ (Waveform)Phase Noise
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Electron Microscope Analyzer
QUANTAX FlatQUAD
QUANTAX FlatQUAD is the EDS microanalysis system based on the revolutionary XFlash® FlatQUAD. This annular four-channel silicon drift detector is inserted between SEM pole piece and sample, achieving maximum solid angle in EDS.
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Electron Microscope Analyzer
QUANTAX EDS for TEM
Long standing expertise in EDS ensures the configuration of the best solution for your specific microscope (STEM, TEM or SEM) thanks to slim-line detector design and geometrical optimization for each microscope pole piece and EDS flange type
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MultiBeam System
FIB
An easy-to-use, out-lens type scanning electron microscope (SEM) equipped with a Schottky electron gun, as well as a new FIB column capable of large current processing (maximum ion current 90nA) installed into one chamber. JIB-4610F enables high-resolution SEM observation after high-speed cross-section milling with FIB, and high-speed analysis with a variety of analytical instruments, such as energy dispersive X-ray spectroscopy (EDS) that takes advantage of the Schottky electron gun delivering a large probe current (200nA), electron back scatter diffraction (EBSD) to perform crystallographic characterization, and cathodoluminescence (CLD). In addition, the 3D analysis function Cut & See is included in the standard configuration, allowing cross-section milling to be executed automatically at fixed intervals, while acquiring SEM images for each cross section.
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Electron Microscope Analyzer
QUANTAX Micro-XRF
Micro-X-ray Fluorescence (Micro- XRF) spectroscopy analysis is a complementary non-destructive analytical technique to traditional Energy Dispersive Spectroscopy (EDS) analysis using a Scanning Electron Microscope (SEM).
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Wafer Cathodoluminescence Microscope
Säntis 300
Attolight’s Quantitative CL-SEM offers “No Compromise” large field fast scanning simultaneous acquisition of SEM images, hyperspectral CL maps, and optical spectra. Smaller diameter wafers, or miscellaneously shaped substrates are manually loaded on intermediary 300mm susceptors subsequently handled automatically by the tool.
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Electromagnetic Radiation Analyzer
SEM-600
Beijing KeHuan Century EMC Technology Co,.LTD
Broadband Electromagnetic Radiation Analyzer SEM-600 can accurately measure various complex electromagnetic environments. The probe covers all frequencies from low frequency to microwave radiation. It can measure electric field strength and magnetic field by equipping different types of probes. Intensity (magnetic induction) and power density, it is also equipped with ordinary probes and other weighted probes based on human safety standards.
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Vehicle Electromagnetic Field Exposure Test System
SEM-400
Beijing KeHuan Century EMC Technology Co,.LTD
Vehicles are our daily public transportation. Electromagnetic pollution in vehicles has attracted more and more public attention. The newly revised compulsory standard GB27630-201X "Passenger Car Air Quality Evaluation Standard" intends to require the electromagnetic field in the car as one of the indicators, according to GB/T37130-2018 "Measurement method of vehicle electromagnetic field relative to human exposure" The measurement method is to measure the intensity of the magnetic field in the car. In the frequency range of 10Hz-400kHz, the electromagnetic field measurement result should meet the public limit requirements of GB8702-2014 for electromagnetic exposure.
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Metallurgy Analysis
The metallurgical group is well equipped and staffed (9 full-time metallurgists and technicians) to evaluate materials ranging from cast iron to superalloys to composites. They are experienced in classical metallographic techniques, as well as the latest preparation methods. Advanced analytical tools such as image analysis and scanning electron microscopy (SEM) are used in their evaluations.
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Saluki CSA-M Series Signal Analyzer (Benchtop)
Saluki CSA-M series benchtop signal analyzer reaches the frequency from 100 kHz to up to 26.5 GHz with a maximum of 40 MHz analysis bandwidth. It can test signal power, frequency, phase, P-1, TOI, OBW, channel power, spurious, ACPR, CCDF, SEM, EVM, and other indicators.
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Magnetic Field Cancelling System
MR-3
3-axis magnetic field cancelling system for electron microscopes (SEM and TEM), electron and ion beam experiments, nanotechnology, biomagnetic investigations, etc. High reliability through rugged analog design. No tedious programming, no chrashs. More than 1000 MR-3 systems sold worldwide.
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Electron Microscope Analyzers
Bruker’s electron microscope analyzers EDS, WDS, EBSD and Micro-XRF on SEM offer the most comprehensive compositional and structural analysis of materials available today. The full integration of all these techniques into the ESPRIT software allows you to easily combine data obtained by these complementary methods for best results.
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Electron Microscope Analyzers
Bruker’s electron microscope analyzers EDS, WDS, EBSD and Micro-XRF on SEM offer the most comprehensive compositional and structural analysis of materials available today. The full integration of all these techniques into the ESPRIT software allows you to easily combine data obtained by these complementary methods for best results.
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FAST SDD and C2 Window
EDS (SEM) Applications
Amptek is pleased to offer our improved line of silicon drift detectors (SDDs) for energy dispersive spectroscopy (EDS) use within scanning electron microscopes (SEMs). Using our proprietary Patented “C-Series” silicon nitride (Si3N4) X-ray windows, the low-energy response of our FAST SDD® extends down to beryllium (Be). The FAST SDD® with its high intrinsic efficiency is ideal for EDS, which is also known as energy dispersive X-ray spectroscopy (EDX or XEDS) and energy dispersive X-ray analysis (EDXA) or energy dispersive X-ray microanalysis (EDXMA).
