SENTECH Instruments GmbH.
SENTECH Instruments develops, manufactures, and sells worldwide advanced quality instrumentation for Plasma Etching, PECVD, Atomic Layer Deposition, Thin Film Measurement (Spectroscopic Ellipsometry, Spectroscopic Reflectometry and Laser Ellipsometer) and Photovoltaics.
- 49 (0)30 6392 5520
- 49 (0)30 6392 5522
- marketing@sentech.de
- Schwarzschildstraße 2
Berlin, 12489
Germany
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product
Spectroscopic Ellipsometers
SENresearch 4.0
The SENresearch 4.0 is the new SENTECH spectroscopic ellipsometer. Every individual SENresearch 4.0 spectroscopic ellipsometer is a customer-specific configuration of spectral range, options and field upgradable accessories. SENresearch 4.0 uses fast FTIR ellipsometry for the NIR up to 2,500 nm or 3,500 nm, respectively. It provides broadest spectral range with best S/N ratio and highest, selectable spectral resolution. Silicon films up to 200 µm thickness can be measured. The measurement speed of FTIR ellipsometry compares to diode array configurations, which are also selectable up to 1,700 nm. The new motorized Pyramid Goniometer features an angle range from 20 deg to 100 deg. Optical encoders ensure highest precision and long term stability of angle settings. The spectroscopic ellipsometer arms can be moved independently for scatterometry and angle resolved transmission measurements.
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Spectroscopic Ellipsometer Software
SpectraRay/4
SpectraRay/4, the SENTECH proprietary spectroscopic ellipsometry software, includes data acquisition, modeling, fitting, and extended reporting of ellipsometric, reflection, and transmission data. It supports variable angle, multi-experiment, and combined photometric measurements. SpectraRay/4 includes a huge library of materials data based on SENTECH thickness measurements and literature data as well. The large number of dispersion models allows modeling of nearly any type of material.
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Film Thickness Probe
FTPadv
The SE 500adv combines ellipsometry and reflectometry to eliminate the ambiguity of measuring layer thickness of transparent films. It extends the measureable thickness to 25 µm. Therefore the SE 500adv extends the capability of the standard laser ellipsometer SE 400adv especially for analyzing thicker films of dielectrics, organic materials, photoresists, silicon, and polysilicon.
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Spectroscopic Reflectometry
Measure reflectance of flat or curved samples with smooth or rough surface.
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Laser Ellipsometer
The laser ellipsometer can be utilized to characterize single films and substrates from selectable, application specific angles of incidence.
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Spectroscopic Ellipsometry
Spectroscopic ellipsometers measure film thickness and refractive index of single layers, and multi‑layer stacks. Related properties of bulk materials, isotropic and anisotropic materials, surface and interface roughness as well as gradients can be analysed.
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Laser Ellipsometers
CER – SE 500adv
* The SE 500adv combines ellipsometry and reflectometry, * Eliminates the ambiguity in layer thickness determination for transparent films, * Extends thickness measurement to 25000 nm. # Laser wavelength 632.8 nm# Spectral range of reflectivity from 450 nm to 920 nm wavelength# Spot size 80 ?m
